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Title: Method and apparatus for testing tunnel magnetoresistive effect element, manufacturing method of tunnel magnetoresistive effect element and tunnel magnetoresistive effect element

Abstract: A method for testing a TMR element includes a step of measuring a plurality of resistances of the TMR element by feeding a plurality of sense currents with different current values each other through the TMR element, a step of calculating a ratio of change in resistance from the measured plurality of resistances of the TMR element, and a step of evaluating the TMR element using the calculated ratio of change in resistance.

Patent Number: 7,417,442 Issued on 08/26/2008 to Hachisuka,   et al.

Inventors: Hachisuka; Nozomu (Tokyo, JP), Inage; Kenji (Tokyo, JP), Takahashi; Norio (Tokyo, JP), Shimizu; Tatsushi (Shatin, CN), Wong; Pak Kin (Shatin, CN)
Assignee: TDK Corporation (Chuo-Ku, Tokyo, JP)
SAE Magnetics (H.K.) Ltd. (Hong Kong, CN)
Appl. No.: 11/130,258
Filed: May 17, 2005
Foreign Application Priority Data
Jul 28, 2004 [JP] 2004-220247
Mar 22, 2005 [JP] 2005-081768

Current U.S. Class: 324/691 ; 324/230; 324/719; 338/32R; 360/324.2
Current International Class: G01R 27/08 (20060101); H01L 21/66 (20060101)
Field of Search: 324/691,719,230 338/32R 360/324.2

References Cited [Referenced By]
U.S. Patent Documents
3256483 June 1966 Broadbent
6067200 May 2000 Ohba et al.
6473257 October 2002 Shimazawa et al.
6927569 August 2005 Worledge et al.
2002/0154540 October 2002 Sekiguchi et al.
Foreign Patent Documents
2004-062954 Feb., 2004 JP
Primary Examiner: Nguyen; Vincent Q
Attorney, Agent or Firm: Frommer Lawrence & Haug
Claims


The invention claimed is:

1. A method for testing a tunnel magnetoresistive effect element comprising the steps of: measuring a plurality of resistances of said tunnel magnetoresistive effect element by feeding a plurality discontinuous of sense currents with different current values each other through said tunnel magnetoresistive effect element; calculating a ratio of change in resistance from the measured plurality of resistances of said tunnel magnetoresistive effect element evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance.

2. The method as claimed in claim 1, wherein the measuring step comprises feeding a plurality of discontinuous sense currents with different current values each other through said tunnel magnetoresistive effect element.

3. The method as claimed in claim 1, wherein the measuring step comprises measuring two resistances of said tunnel magnetoresistive effect element by feeding two sense currents with different current values each other through said tunnel magnetoresistive effect element, and wherein the calculating step comprises calculating a ratio of change in resistance based upon the measured two resistances of said tunnel magnetoresistive effect element.

4. A method for testing a tunnel magnetoresistive effect element comprising the steps of: measuring a first resistance of said tunnel magnetoresistive effect element by feeding a first sense current with a first current value through said tunnel magnetoresistive effect element, and a second resistance of said tunnel magnetoresistive effect element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through said tunnel magnetoresistive effect element, said second sense current being discontinuous with said first sense current; calculating a ratio of change in resistance from the measured first and second resistances of said tunnel magnetoresistive effect element; and evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance.

5. The method as claimed in claim 4, wherein the measuring step comprises feeding a second sense current that is discontinuous to said first sense current through said tunnel magneto resistive effect element.

6. The method as claimed in claim 4, wherein the calculating step comprises calculating the ratio of change in resistance from a difference between said measured first and second resistances.

7. The method as claimed in claim 4, wherein the calculating step comprises calculating the ratio of change in resistance from an expression of (R.sub.2-R.sub.1)/R.sub.1.times.100 (%), where said first resistance is indicated by R.sub.1 and said second resistance is indicated by R.sub.2.

8. The method as claimed in claim 7, wherein the evaluating step comprises evaluating said tunnel magnetoresistive effect element as a non-defective product when the calculated ratio of change in resistance (R.sub.2-R.sub.1)/R.sub.1.times.100 (%) is less than a predetermined threshold.

9. The method as claimed in claim 8, wherein said tunnel magnetoresistive effect element has a tunnel barrier layer made of an oxide of aluminum, wherein the measuring step comprises feeding a first sense current of 0.1 mA through said tunnel magnetoresistive effect element, and feeding a second sense current of 0.4 mA through said tunnel magnetoresistive effect element, and wherein said predetermined threshold is -0.8 (%).

10. The method as claimed in claim 4, wherein the measuring step comprises applying an external DC magnetic field in a predetermined direction to said tunnel magnetoresistive effect element so that the measuring step is performed under the applied external DC magnetic field.

11. The method as claimed in claim 4, wherein said tunnel magnetoresistive effect element is a tunnel magnetoresistive effect head element.

12. The method as claimed in claim 4, wherein said tunnel magnetoresistive effect element is a magnetoresistive effect random access memory cell.

13. An apparatus for testing a tunnel magnetoresistive effect element comprising: means for measuring a first resistance of said tunnel magnetoresistive effect element by feeding a first sense current with a first current value through said tunnel magnetoresistive effect element, and a second resistance of said tunnel magnetoresistive effect element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through said tunnel magnetoresistive effect element, said second send current being discontinuous with said first sense current; means for calculating a ratio of change in resistance from the measured first and second resistances of said tunnel magnetoresistive effect element; and means for evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance.

14. The apparatus as claimed in claim 13, wherein the measuring means comprises means for feeding a second sense current that is discontinuous to said first sense current through said tunnel magnetoresistive effect element.

15. The apparatus as claimed in claim 13, wherein the calculating means comprises means for calculating the ratio of change in resistance from a difference between said measured first and second resistances.

16. The apparatus as claimed in claim 13, wherein the calculating means comprises means for calculating the ratio of change in resistance from an expression of (R.sub.2-R.sub.1)/R.sub.1.times.100 (%), where said first resistance is indicated by R.sub.1 and said second resistance is indicated by R.sub.2.

17. The apparatus as claimed in claim 16, wherein the evaluating means comprises means for evaluating said tunnel magnetoresistive effect element as a non-defective product when the calculated ratio of change in resistance (R.sub.2-R.sub.1)/R.sub.1.times.100 (%) is less than a predetermined threshold.

18. The apparatus as claimed in claim 17, wherein said tunnel magnetoresistive effect element has a tunnel barrier layer made of an oxide of aluminum, wherein the measuring means comprises means for feeding a first sense current of 0.1 mA through said tunnel magnetoresistive effect element, and means for feeding a second sense current of 0.4 mA through said tunnel magnetoresistive effect element, and wherein said predetermined threshold is -0.8 (%).

19. The apparatus as claimed in claim 13, wherein the measuring means comprises means for applying an external DC magnetic field in a predetermined direction to said tunnel magnetoresistive effect element so that the measurement is performed under the applied external DC magnetic field.

20. The apparatus as claimed in claim 13, wherein said tunnel magnetoresistive effect element is a tunnel magnetoresistive effect head element.

21. The apparatus as claimed in claim 13, wherein said tunnel magnetoresistive effect element is a magnetoresistive effect random access memory cell.

22. A manufacturing method of a tunnel magnetoresistive effect element comprising: a wafer process for forming many thin-film tunnel magnetoresistive effect elements on a wafer; a cut process for cutting said wafer into a plurality of bar members, each of said bar members having the aligned tunnel magnetoresistive effect elements; a measurement process for measuring a first resistance of the tunnel magnetoresistive effect element to be tested on said bar member by feeding a first sense current with a first current value through said tunnel magnetoresistive effect element, and measuring a second resistance of said tunnel magnetoresistive effect element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through said tunnel magnetoresistive effect element, said second sense current being discontinuous with said first sense current; a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of said tunnel magnetoresistive effect element; an evaluation process for evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance a separation process for cutting the evaluated bar member into individual magnetic head sliders, each of said individual magnetic head slider having said tunnel magnetoresistive effect element.

23. The manufacturing method as claimed in claim 22, wherein the measurement process comprises feeding a second sense current that is discontinuous to said first sense current through said tunnel magnetoresistive effect element.

24. The manufacturing method as claimed in claim 22, wherein the calculation process comprises calculating the ratio of change in resistance from a difference between said measured first and second resistances.

25. The manufacturing method as claimed in claim 22, wherein the calculation process comprises calculating the ratio of change in resistance from an expression of (R.sub.2-R.sub.1)/R.sub.1.times.100 (%), where said first resistance is indicated by R.sub.1 and said second resistance is indicated by R.sub.2.

26. The manufacturing method as claimed in claim 25, wherein the evaluation process comprises evaluating said tunnel magnetoresistive effect element as a non-defective product when the calculated ratio of change in resistance (R.sub.2-R.sub.1)/R.sub.1.times.100 (%) is less than a predetermined threshold.

27. The manufacturing method as claimed in claim 26, wherein said tunnel magnetoresistive effect element has a tunnel barrier layer made of an oxide of aluminum, wherein the measurement process comprises feeding a first sense current of 0.1 mA through said tunnel magnetoresistive effect element, and feeding a second sense current of 0.4 mA through said tunnel magnetoresistive effect element, and wherein said predetermined threshold is -0.8 (%).

28. The manufacturing method as claimed in claim 22, wherein the measurement process comprises applying an external DC magnetic field in a predetermined direction to said tunnel magnetoresistive effect element so that the measurement process is performed under the applied external DC magnetic field.

29. The manufacturing method as claimed in claim 22, wherein said tunnel magnetoresistive effect element is a tunnel magnetoresistive effect head element.

30. The manufacturing method as claimed in claim 22, wherein said tunnel magnetoresistive effect element is a magnetoresistive effect random access memory cell.

31. A manufacturing method of a tunnel magneto resistive effect element comprising: a wafer process for forming many thin-film tunnel magnetoresistive effect elements on a wafer; a measurement process for measuring a first resistance of the tunnel magneto resistive effect element to be tested on said wafer by feeding a first sense current with a first current value through said tunnel magnetoresistive effect element, and measuring a second resistance of said tunnel magnetoresistive effect element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through said tunnel magnetoresistive effect element, said second sense current being discontinuous with said first sense current; a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of said tunnel magnetoresistive effect element; an evaluation process for evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance; a cut process for cutting the evaluated wafer into a plurality of bar members, each of said bar members having the aligned tunnel magnetoresistive effect elements; and a separation process for cutting each bar member into individual magnetic head sliders, each of said individual magnetic head slider having said tunnel magnetoresistive effect element.

32. The manufacturing method as claimed in claim 31, wherein the measurement process comprises feeding a second sense current that is discontinuous to said first sense current through said tunnel magnetoresistive effect element.

33. The manufacturing method as claimed in claim 31, wherein the calculation process comprises calculating the ratio of change in resistance from a difference between said measured first and second resistances.

34. The manufacturing method as claimed in claim 31, wherein the calculation process comprises calculating the ratio of change in resistance from an expression of (R.sub.2-R.sub.1)/R.sub.1.times.100 (%), where said first resistance is indicated by R.sub.1 and said second resistance is indicated by R.sub.2.

35. The manufacturing method as claimed in claim 34, wherein the evaluation process comprises evaluating said tunnel magnetoresistive effect element as a non-defective product when the calculated ratio of change in resistance (R.sub.2-R.sub.1)/R.sub.1.times.100 (%) is less than a predetermined threshold.

36. The manufacturing method as claimed in claim 35, wherein said tunnel magnetoresistive effect element has a tunnel barrier layer made of an oxide of aluminum, wherein the measurement process comprises feeding a first sense current of 0.1 mA through said tunnel magnetoresistive effect element, and feeding a second sense current of 0.4 mA through said tunnel magnetoresistive effect element, and wherein said predetermined threshold is -0.8 (%).

37. The manufacturing method as claimed in claim 31, wherein the measurement process comprises applying an external DC magnetic field in a predetermined direction to said tunnel magnetoresistive effect element so that the measurement process is performed under the applied external DC magnetic field.

38. The manufacturing method as claimed in claim 31, wherein said tunnel magnetoresistive effect element is a tunnel magnetoresistive effect head element.

39. The manufacturing method as claimed in claim 31, wherein said tunnel magnetoresistive effect element is a magnetoresistive effect random access memory cell.

40. A manufacturing method of a tunnel magnetoresistive effect element comprising: a wafer process for forming many thin-film tunnel magnetoresistive effect elements on a wafer; a cut process for cutting said wafer into a plurality of bar members, each of said bar members having the aligned tunnel magnetoresistive effect elements; a separation process for cutting each of said bar members into individual magnetic head sliders, each of said individual magnetic head slider having said tunnel magnetoresistive effect element; a measurement process for measuring a first resistance of the tunnel magnetoresistive effect element to be tested by feeding a first sense current with a first current value through said tunnel magnetoresistive effect element, and measuring a second resistance of said tunnel magnetoresistive effect element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through said tunnel magnetoresistive effect element, said second sense current being discontinuous with said first sense current; a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of said tunnel magnetoresistive effect element; and an evaluation process for evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance.

41. The manufacturing method as claimed in claim 40, wherein the measurement process comprises feeding a second sense current that is discontinuous to said first sense current through said tunnel magnetoresistive effect element.

42. The manufacturing method as claimed in claim 40, wherein the calculation process comprises calculating the ratio of change in resistance from a difference between said measured first and second resistances.

43. The manufacturing method as claimed in claim 40, wherein the calculation process comprises calculating the ratio of change in resistance from an expression of (R.sub.2-R.sub.1)/R.sub.1.times.100 (%), where said first resistance is indicated by R.sub.1 and said second resistance is indicated by R.sub.2.

44. The manufacturing method as claimed in claim 43, wherein the evaluation process comprises evaluating said tunnel magnetoresistive effect element as a non-defective product when the calculated ratio of change in resistance (R.sub.2-R.sub.1)/R.sub.1.times.100 (%) is less than a predetermined threshold.

45. The manufacturing method as claimed in claim 44, wherein said tunnel magnetoresistive effect element has a tunnel barrier layer made of an oxide of aluminum, wherein the measurement process comprises feeding a first sense current of 0.1 mA through said tunnel magneto resistive effect element, and feeding a second sense current of 0.4 mA through said tunnel magneto resistive effect element, and wherein said predetermined threshold is -0.8 (%).

46. The manufacturing method as claimed in claim 40, wherein the measurement process comprises applying an external DC magnetic field in a predetermined direction to said tunnel magneto resistive effect element so that the measurement process is performed under the applied external DC magnetic field.

47. The manufacturing method as claimed in claim 40, wherein said tunnel magnetoresistive effect element is a tunnel magnetoresistive effect head element.

48. The manufacturing method as claimed in claim 40, wherein said tunnel magneto resistive effect element is a magnetoresistive effect random access memory cell.

49. A tunnel magnetoresistive effect element manufactured by a method of a comprising: a wafer process for forming many thin-film tunnel magnetoresistive effect elements on a wafer; a cut process for cutting said wafer into a plurality of bar members, each of said bar members having the aligned tunnel magnetoresistive effect elements; a measurement process for measuring a first resistance of the tunnel magnetoresistive effect element to be tested on said bar member by feeding a first sense current with a first current value through said tunnel magnetoresistive effect element, and measuring a second resistance of said tunnel magnetoresistive effect element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through said tunnel magnetoresistive effect element, said second sense current being discontinuous with said first sense current; a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of said tunnel magnetoresistive effect element; an evaluation process for evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance; and a separation process for cutting the evaluated bar member into individual magnetic head sliders, each of said individual magnetic head slider having said tunnel magnetoresistive effect element.

50. The tunnel magnetoresistive effect element as claimed in claim 49, wherein said tunnel magnetoresistive effect element has a tunnel barrier layer made of an oxide of aluminum.

51. A tunnel magnetoresistive effect element manufactured by a method of a comprising: a wafer process for forming many thin-film tunnel magnetoresistive effect elements on a wafer; a measurement process for measuring a first resistance of the tunnel magnetoresistive effect element to be tested on said wafer by feeding a first sense current with a first current value through said tunnel magnetoresistive effect element, and measuring a second resistance of said tunnel magnetoresistive effect element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through said tunnel magnetoresistive effect element, said second sense current being discontinuous with said first sense current; a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of said tunnel magnetoresistive effect element; an evaluation process for evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance; a cut process for cutting the evaluated wafer into a plurality of bar members, each of said bar members having the aligned tunnel magnetoresistive effect elements; and a separation process for cutting each bar member into individual magnetic head sliders, each of said individual magnetic head slider having said tunnel magnetoresistive effect element.

52. The tunnel magnetoresistive effect element as claimed in claim 51, wherein said tunnel magnetoresistive effect element has a tunnel barrier layer made of an oxide of aluminum.

53. A tunnel magnetoresistive effect element manufactured by a method of a comprising: a wafer process for forming many thin-film tunnel magneto resistive effect elements on a wafer; a cut process for cutting said wafer into a plurality of bar members, each of said bar members having the aligned tunnel magnetoresistive effect elements; a separation process for cutting each of said bar members into individual magnetic head sliders, each of said individual magnetic head slider having said tunnel magnetoresistive effect element; a measurement process for measuring a first resistance of the tunnel magnetoresistive effect element to be tested by feeding a first sense current with a first current value through said tunnel magnetoresistive effect element, and measuring a second resistance of said tunnel magnetoresistive effect element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through said tunnel magnetoresistive effect element, said second sense current being discontinuous with said first sense current; a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of said tunnel magnetoresistive effect element an evaluation process for evaluating said tunnel magnetoresistive effect element using the calculated ratio of change in resistance.

54. The tunnel magnetoresistive effect element as claimed in claim 53, wherein said tunnel magnetoresistive effect element has a tunnel barrier layer made of an oxide of aluminum.
Description


PRIORITY CLAIM

This application claims priority from Japanese patent application No. 2004-220247, filed on Jul. 28, 2004 and Japanese patent application No. 2005-081768, filed on Mar. 22, 2005, which are incorporated herein by reference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a method and apparatus for testing a tunnel magnetoresistive effect (TMR) element such as a TMR read head element using the tunnel magnetoresistive effect or a magnetoresistive random access memory (MRAM) cell, to a manufacturing method of a TMR element, and to a TMR element.

2. Description of the Related Art

An evaluation test is in general performed for determining whether or not a thin-film magnetic head with a TMR read head element is a non-defective product, during or after manufacturing the magnetic head. This evaluation test includes a reliability test for confirming that a breakdown voltage of the MR head element is sufficiently high to withstand an extended period of use.

U.S. Pat. No. 6,473,257 discloses a testing method for confirming a reliability of a TMR read head element without damaging or breaking the TMR read head element. In this testing method, a performance of the TMR read head element such as its electromagnetic conversion performance is measured by using a test current with a predetermined value. The value of the test current value is determined by measuring a resistance of the TMR read head element when a predetermined initial current is flowing there through, or determined by repeatedly measuring a modified current when a reference voltage is applied to the TMR read head element and by measuring a resistance of the TMR read head element when the finally measured modified current is flowing there through.

However, this testing method disclosed in U.S. Pat. No. 6,473,257 requires a performance test of the TMR read head element such as an electromagnetic conversion performance test of the TMR read head element, and thus requires a great deal of expense in manpower and in time for confirming a reliability.

BRIEF SUMMARY OF THE INVENTION

It is therefore an object of the present invention to provide a method and apparatus for testing a TMR element, a manufacturing method of a TMR element, and a TMR element, whereby a reliability of the TMR element can be quickly and easily confirmed without failing.

According to the present invention, a method for testing a TMR element includes a step of measuring a plurality of resistances of the TMR element by feeding a plurality of sense currents with different current values each other through the TMR element, a step of calculating a ratio of change in resistance from the measured plurality of resistances of the TMR element, and a step of evaluating the TMR element using the calculated ratio of change in resistance.

In this case, it is preferred that the measuring step includes feeding a plurality of discontinuous sense currents with different current values each other through the TMR element. Feeding of a plurality of discontinuous sense currents means that feeding of one sense current is stopped after the feeding thereof, and then another sense current is fed.

It is also preferred that the measuring step includes measuring two resistances of the TMR element by feeding two sense currents with different current values each other through the TMR element, and that the calculating step includes calculating a ratio of change in resistance based upon the measured two resistances of the TMR element.

According to the present invention, also, a method for testing a TMR element includes a step of measuring a first resistance of the TMR element by feeding a first sense current with a first current value through the TMR element, and a second resistance of the TMR element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through the TMR element, a step of calculating a ratio of change in resistance from the measured first and second resistances of the TMR element, and a step of evaluating the TMR element using the calculated ratio of change in resistance.

Sense currents with different current values are fed to the TMR element and the resistances of the TMR element at the different current values are measured to calculate a ratio of change in resistance. The calculated ratio of change in resistance is used for evaluating the TMR element. This measurement, calculation and evaluation are performed for every TMR element. Element breakdown voltages of TMR elements having small ratios of change in resistance are lower than that of TMR elements having large ratios of change in resistance. Therefore, measurement of resistances by feeding sense currents with different current values and calculation of a ratio of change in resistance from thus measured resistances allow confirmation of reliability of the TMR element. Also, this evaluation test of non-defective and defective products can be extremely easily and quickly performed. Furthermore, because the evaluation test can be performed without destroying the TMR element, 100% inspection of the manufactured TMR elements becomes possible. As a result, a reliability of the TMR element can be quickly and easily confirmed without failing, and thus it is extremely effective for mass-production.

It is preferred that the measuring step includes feeding a second sense current that is discontinuous to the first sense current through the TMR element. The second sense current is discontinuous to the first sense current means that feeding of the first sense current is stopped after the feeding thereof, and then the second sense current is fed.

It is also preferred that the calculating step includes calculating the ratio of change in resistance from a difference between the measured first and second resistances.

It is further preferred that the calculating step includes calculating the ratio of change in resistance from an expression of (R.sub.2-R.sub.1)/R.sub.1.times.100(%), where the first resistance is indicated by R.sub.1 and the second resistance is indicated by R.sub.2.

It is also preferred that the evaluating step includes evaluating the TMR element as a non-defective product when the calculated ratio of change in resistance (R.sub.2-R.sub.1)/R.sub.1.times.100(%) is less than a predetermined threshold. If the TMR element has a tunnel barrier layer made of an oxide of aluminum (Al) such as for example Al.sub.2O.sub.3, and the measuring step includes feeding a first sense current of 0.1 mA through the TMR element and feeding a second sense current of 0.4 mA through the TMR element, it is preferred that the predetermined threshold is -0.8(%). If the tunnel barrier layer of the TMR element is made of a material other than the oxide of Al, it is possible to similarly evaluate the TMR element by correspondingly determining current values of the first and second sense currents and a threshold value of the resistance change ratio.

It is preferred that the measuring step includes applying an external DC magnetic field in a predetermined direction to the TMR element so that the measuring step is performed under the applied external DC magnetic field.

It is preferred that the TMR element is a TMR head element or an MRAM cell.

According to the present invention, further, an apparatus for testing a TMR element includes a unit for measuring a first resistance of the TMR element by feeding a first sense current with a first current value through the TMR element, and a second resistance of the TMR element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through the TMR element, a unit for calculating a ratio of change in resistance from the measured first and second resistances of the TMR element, and a unit for evaluating the TMR element using the calculated ratio of change in resistance.

Measurement of resistances by feeding sense currents with different current values and calculation of a ratio of change in resistance from thus measured resistances allow confirmation of reliability of the TMR element. Also, the evaluation test of non-defective and defective products can be extremely easily and quickly performed. Furthermore, because the evaluation test can be performed without destroying the TMR element, 100% inspection of the manufactured TMR elements becomes possible. As a result, a reliability of the TMR element can be quickly and easily confirmed without failing, and thus it is extremely effective for mass-production.

It is preferred that the measuring unit includes a unit for feeding a second sense current that is discontinuous to the first sense current through the TMR element. The second sense current is discontinuous to the first sense current means that feeding of the first sense current is stopped after the feeding thereof, and then the second sense current is fed.

It is also preferred that the calculating unit includes a unit for calculating the ratio of change in resistance from a difference between the measured first and second resistances.

It is further preferred that the calculating unit includes a unit for calculating the ratio of change in resistance from an expression of (R.sub.2-R.sub.1)/R.sub.1.times.100(%), where the first resistance is indicated by R.sub.1 and the second resistance is indicated by R.sub.2.

It is also preferred that the evaluating unit includes a unit for evaluating the TMR element as a non-defective product when the calculated ratio of change in resistance (R.sub.2-R.sub.1)/R.sub.1.times.100(%) is less than a predetermined threshold. If the TMR element has a tunnel barrier layer made of an oxide of aluminum (Al) such as for example Al.sub.2O.sub.3, and the measuring unit includes a unit for feeding a first sense current of 0.1 mA through the TMR element, and a unit for feeding a second sense current of 0.4 mA through the TMR element, it is preferred that the predetermined threshold is -0.8(%). If the tunnel barrier layer of the TMR element is made of a material other than the oxide of Al, it is possible to similarly evaluate the TMR element by correspondingly determining current values of the first and second sense currents and a threshold value of the resistance change ratio.

It is preferred that the measuring unit includes a unit for applying an external DC magnetic field in a predetermined direction to the TMR element so that the measurement is performed under the applied external DC magnetic field.

It is preferred that the TMR element is a TMR head element or an MRAM cell.

According to the present invention, a manufacturing method of a TMR element includes a wafer process for forming many thin-film TMR elements on a wafer, a cut process for cutting the wafer into a plurality of bar members, each of the bar members having the aligned TMR elements, a measurement process for measuring a first resistance of the TMR element to be tested on the bar member by feeding a first sense current with a first current value through the TMR element, and measuring a second resistance of the TMR element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through the TMR element, a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of the TMR element, an evaluation process for evaluating the TMR element using the calculated ratio of change in resistance, and a separation process for cutting the evaluated bar member into individual magnetic head sliders, each of the individual magnetic head slider having the TMR element.

According to the present invention, also a manufacturing method of a TMR element includes a wafer process for forming many thin-film TMR elements on a wafer, a measurement process for measuring a first resistance of the TMR element to be tested on the wafer by feeding a first sense current with a first current value through the TMR element, and measuring a second resistance of the TMR element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through the TMR element, a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of the TMR element, an evaluation process for evaluating the TMR element using the calculated ratio of change in resistance, a cut process for cutting the evaluated wafer into a plurality of bar members, each of the bar members having the aligned TMR elements, and a separation process for cutting each bar member into individual magnetic head sliders, each of the individual magnetic head slider having the TMR element.

According to the present invention, further, a manufacturing method of a TMR element includes a wafer process for forming many thin-film TMR elements on a wafer, a cut process for cutting the wafer into a plurality of bar members, each of the bar members having the aligned TMR elements, a separation process for cutting each of the bar members into individual magnetic head sliders, each of the individual magnetic head slider having the TMR element, a measurement process for measuring a first resistance of the TMR element to be tested by feeding a first sense current with a first current value through the TMR element, and measuring a second resistance of the TMR element by feeding a second sense current with a second current value of which absolute value is greater than that of the first current value through the TMR element, a calculation process for calculating a ratio of change in resistance from the measured first and second resistances of the TMR element, and an evaluation process for evaluating the TMR element using the calculated ratio of change in resistance.

Measurement of resistances by feeding sense currents with different current values and calculation of a ratio of change in resistance from thus measured resistances allow confirmation of reliability of the TMR element. Also, the evaluation test of non-defective and defective products can be extremely easily and quickly performed. Furthermore, because the evaluation test can be performed without destroying the TMR element, 100% inspection of the manufactured TMR elements becomes possible. As a result, a reliability of the TMR element can be quickly and easily confirmed without failing, and thus it is extremely effective for mass-production.

It is preferred that the measuring process includes feeding a second sense current that is discontinuous to the first sense current through the TMR element. The second sense current is discontinuous to the first sense current means that feeding of the first sense current is stopped after the feeding thereof, and then the second sense current is fed.

It is also preferred that the calculation process includes calculating the ratio of change in resistance from a difference between the measured first and second resistances.

It is further preferred that the calculation process includes calculating the ratio of change in resistance from an expression of (R.sub.2-R.sub.1)/R.sub.1.times.100(%), where the first resistance is indicated by R.sub.1 and the second resistance is indicated by R.sub.2.

It is also preferred that the evaluation process includes evaluating the TMR element as a non-defective product when the calculated ratio of change in resistance (R.sub.2-R.sub.1)/R.sub.1.times.100(%) is less than a predetermined threshold. If the TMR element has a tunnel barrier layer made of an oxide of aluminum (Al) such as for example Al.sub.2O.sub.3, and the measurement process includes feeding a first sense current of 0.1 mA through the TMR element, and feeding a second sense current of 0.4 mA through the TMR element, it is preferred that the predetermined threshold is -0.8(%). If the tunnel barrier layer of the TMR element is made of a material other than the oxide of Al, it is possible to similarly evaluate the TMR element by correspondingly determining current values of the first and second sense currents and a threshold value of the resistance change ratio.

It is preferred that the measuring process includes applying an external DC magnetic field in a predetermined direction to the TMR element so that the measurement is performed under the applied external DC magnetic field.

It is preferred that the TMR element is a TMR head element or an MRAM cell.

According to the present invention, also, a TMR element manufactured by the above-mentioned manufacturing methods is provided.

It is preferred that the TMR element has a tunnel barrier layer made of an oxide of aluminum (Al) such as for example Al.sub.2O.sub.3.

Further objects and advantages of the present invention will be apparent from the following description of the preferred embodiments of the invention as illustrated in the accompanying drawings.

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWINGS

FIG. 1 is a graph illustrating relationships between sense currents and normalized resistances of a plurality of TMR read head elements;

FIG. 2 is a graph illustrating assumed relationships between voltages applied to four TMR read head element models and currents flowing through the four TMR read head element models;

FIG. 3 is a flow chart schematically illustrating a wafer process for fabricating thin-film magnetic heads with TMR read head elements and an assembling process for forming HGAs as a preferred embodiment according to the present invention;

FIGS. 4a to 4d are views illustrating a part of the processes shown in FIG. 3;

FIG. 5 is a sectional view, seen along a direction orthogonal to an air-bearing surface (ABS) of the head element, illustrating an example structure of each TMR read head element in the embodiment of FIG. 3;

FIG. 6 is a sectional view, seen from the ABS, illustrating the TMR read head element of FIG. 5;

FIG. 7 is a view schematically illustrating a partial configuration of testing a TMR read head element in the embodiment of FIG. 3;

FIG. 8 is a flow chart illustrating a testing procedure in the embodiment of FIG. 1;

FIG. 9 is a current waveform view illustrating a sequence of the testing procedure of FIG. 8;

FIG. 10 is a graph illustrating ratios of change in resistance dMRR (%) calculated from the measured first resistances R.sub.1 when a first sense current of 0.1 mA flows and the measured second resistances R.sub.2 when a second sense current of 0.4 mA flows, with respect to many TMR read head elements;

FIGS. 11a to 11f are graphs illustrating the measured element breakdown voltages versus the ratios of change in resistance dMRR (%) when a first sense current is kept at 0.1 mA and a second sense current is changed, with respect to many TMR read head elements;

FIGS. 12a and 12b are graphs illustrating the measured ratios of change in resistance dMRR (%) versus the first resistance R.sub.1 when a current flows in the opposite directions, with respect to many TMR read head elements; and

FIG. 13 is a sectional view illustrating a structure example of an MRAM cell fabricated in another embodiment according to the present invention.

DETAILED DESCRIPTION OF THE INVENTION

Before describing a preferred embodiment of the present invention, the story leading up to the present invention will be first discussed.

The inventors of this application had found that the changing characteristic in resistance of each TMR read head element differs between TMR read head elements with a predominance of metallic conduction and TMR read head elements with a predominance of tunnel current when the sense currents flowing through the TMR read head elements are increased up to a value at which the element breakdown might occur.

FIG. 1 illustrates characteristics of normalized resistances (%) versus sense currents Is (mA) measured by the inventors with respect to a plurality of TMR read head elements.

As will be noted from the figure, there were two groups, that is, a group B of the TMR read head elements with resistances gradually decreasing when the sense currents increased and a group A of the TMR read head elements with resistances abruptly decreasing when the sense currents increased. In consequence of measurement of element breakdown voltages of the TMR read head elements in both groups, it was revealed that the TMR read head elements in the group B had low breakdown voltages whereas the TMR read head elements in the group A had high breakdown voltages. It was assumed that the TMR read head elements in the group B, provided with low breakdown voltages had pinholes in their barrier layers, and that the TMR read head elements in the group A, provided with high breakdown voltages had less pinhole in their barrier layers.

Then, it was considered that why the ratio of change in resistances differed with each other depending upon whether the barrier layers had pinhole or not.

FIG. 2 illustrates assumed characteristics of currents flowing through four TMR read head element models versus the voltages applied to the four TMR read head element models.

In the figure, reference character "a" denotes a theoretical model of TMR read head element with pinholes in its barrier layer, in which increase in temperature is not considered, that is an ohmic conductive model similar to a normal metal resistor, "b" denotes an actual model of TMR read head element with pinholes in its barrier layer, in which increase in temperature is considered, "c" denotes a theoretical model of TMR read head element with less pinhole in its barrier layer, in which increase in temperature is not considered, and "d" denotes an actual model of TMR read head element with less pinhole in its barrier layer, in which increase in temperature is considered, respectively.

The theoretical TMR read head element model "a" with pinholes behaves as similar as a metallic conductor. Namely, current flowing there through increases in proportional to increase in voltage applied thereto. Whereas current flowing through the actual TMR read head element model "b" with pinholes increases not so much as that in the theoretical model "a" when the voltage applied thereto increases. This is because when the applied voltage increases, the temperature of this model "b" ascends and thus its resistance increases. Current flowing through the theoretical TMR read head element model "c" with less pinhole increases greater than that in the theoretical model "a" when the voltage applied thereto increases. This is because when the voltage applied to the model "c" increases, its element resistance somewhat decreases. Current flowing through the actual TMR read head element model "d" with less pinhole increases much greater than that in the theoretical model "c" when the voltage applied thereto increases. This is because when the voltage applied to the model "d" increases, its element temperature ascends to activate electrons and thus its resistance greatly decreases.

Thus, the inventors considered that there are two different tends in resistance change between the TMR read head element with pinholes and the TMR read head element with less pinhole, and this difference is appeared as the changing characteristics in resistance depending upon the value of the sense current Is.

Hereinafter, the present invention will be described in detail based upon a preferred embodiment.

FIG. 3 schematically illustrates a wafer process for fabricating thin-film magnetic heads with TMR read head elements and an assembling process for forming HGAs as a preferred embodiment according to the present invention, and FIGS. 4a to 4d illustrate a part of the processes shown in FIG. 3.

First, many TMR read head elements such as TMR read head elements with a longitudinal magnetic recording structure or a perpendicular magnetic recording structure are formed in matrix on a thin-film integration surface of a wafer for thin-film (Step S1).

FIGS. 5 and 6 illustrate an example structure of each TMR read head element thus formed. FIG. 5 shows a section seen along a direction orthogonal to the ABS of the TMR read head element and FIG. 6 shows is a section seen from the ABS.

As shown in FIGS. 5 and 6, a TMR film of the TMR read head element has a multilayered structure of an anti-ferromagnetic layer (pin layer) 51, a pined layer 52, a tunnel barrier layer 53, a free layer 54 and a cap layer 55 sequentially laminated on a lower shield and electrode layer 50. On the TMR film, a metal gap layer 56 and an upper shield and electrode layer 57 are laminated. Bias layers 58 are formed in lateral regions located in the track-width direction of the TMR film. In modifications, the order of lamination of the TMR multi-layers may be in inverse. The tunnel barrier layer 53 is made of oxide of Al, Ti, Zr, Hf, Ta, Mg or else.

Then, a resistance of each TMR read head element is measured (Step S2). The resistance is measured using a test apparatus that will be mentioned later by bringing a pair of probes into electrical contact with terminal pads of each TMR read head element in the wafer, feeding a sense current with a first current value of for example 0.1 mA through the TMR read head element, and measuring its output voltage to calculate the resistance of the TMR read head element. Each calculated resistance is stored in the test apparatus as a wafer process initial resistance R.sub.0.

Thereafter, inductive write head elements are formed on the respective TMR read head elements (Step S3). FIG. 4a illustrates a wafer 40 on which many thin-film magnetic head elements 41 consisting of the TMR read head elements and the inductive write head elements are thus formed in matrix.

After forming the inductive write head elements on the wafer, a resistance of each TMR read head element is measured and also a ratio of change in resistance dMRR (%) of each TMR read head element is obtained (Step S4). The resistance is measured using the test apparatus by bringing the pair of probes into electrical contact with terminal pads of each TMR read head element in the wafer, feeding a first sense current with the first current value of for example 0.1 mA through the TMR read head element, and measuring its output voltage to calculate the resistance of the TMR read head element. Each calculated resistance is stored in the test apparatus as a first resistance R.sub.1. The ratio of change in resistance dMRR (%) is obtained using the test apparatus by feeding a second sense current with a second current value of for example 0.4 mA, which is greater than the first current value, through the TMR read head element in a discontinuous manner with respect to the first sense current with the first current value, measuring its output voltage to calculate the resistance of the TMR read head element and to store the calculated resistance in the test apparatus as a second resistance R.sub.2, and then calculating the resistance change ratio dMRR (%) from dMRR (%)=(R.sub.2-R.sub.1)/R.sub.1.times.100. The calculated ratio dMRR (%) is stored in the test apparatus. In this specification, feeding of the second sense current "in a discontinuous manner" with respect to the first sense current means that feeding of the first sense current is stopped after the feeding thereof, and then the second sense current is fed. Contrary to this, feeding of the second sense current "in a continuous manner" with respect to the first sense current means that the first sense current is fed and then the second sense current is fed without stopping the feeding of the first sense current until start of the second sense current feeding. In the present invention, it is preferred that the second sense current is fed in a discontinuous manner with respect to the first sense current. However, in modifications, the second sense current may be fed in a continuous manner with respect to the first sense current.

By comparing the first resistance R.sub.1 obtained at Step S4 and the wafer process initial resistance R.sub.0 obtained at Step S2 with each other, if there is a difference in resistance, it is considered that the resistance of the tunnel barrier layer 53 has changed during the forming process of the inductive write head elements. This change in resistance of the barrier layer may be caused by increased mobility in oxygen or applied electrical or physical damage. In such case, a degree of metallic conduction in the barrier layer is evaluated from the resistance change ratio dMRR (%). This evaluation is performed in this embodiment by judging whether the calculated resistance change ratio dMRR (%) is less than a predetermined threshold of -0.8% or not, namely whether the ratio dMRR (%) is negative and its absolute value is more than 0.8% or not.

The process of the above-mentioned Steps S1-S4 is the wafer process.

Thereafter, the wafer 40 is cut into a plurality of bar members or row bars 43 each of which has a plurality of thin-film magnetic heads 42 aligned along the bar member (Step S5). FIG. 4b illustrates thus formed bar member 43.

Then, a lapping surface of this bar member 43 located at the ABS side is roughly lapped (Step S6), and then this lapping surface is precisely lapped to adjust the MR height (Step S7).

Thereafter, a resistance of each TMR read head element is measured and also a ratio of change in resistance dMRR (%) of each TMR read head element is obtained (Step S8). The resistance and the ratio of change in resistance dMRR (%) are obtained in the similar manner as done at Step S4. However, at Step S8, the calculated first resistance R.sub.1 is also stored in the test apparatus as a machining and assembling process initial resistance R.sub.0'. At Step S8, furthermore, each TMR read head element is evaluated by judging whether the calculated resistance change ratio dMRR (%) is less than a predetermined threshold of -0.8% or not, namely whether the ratio dMRR (%) is negative and its absolute value is more than 0.8% or not. If the ratio dMRR (%) is less than the threshold of -0.8%, a degree of metallic conduction in the barrier layer is low and thus it is evaluated that this TMR read head element is non-defective product with a high element breakdown voltage. Whereas, if the ratio dMRR (%) is equal to or more than the threshold of -0.8%, the lapping may inflict damage to the TMR read head element to provide a high metallic conduction in the barrier layer due to occurrence of pinholes or provide a short-circuit around the barrier layer due to flaws or scratches (smears) occurred by lapping, and thus it is evaluated that this TMR read head element is defective product with a low element breakdown voltage.

For the TMR read head elements with resistance change ratios dMRR (%) after lapping being less than -0.8%, it is possible to confirm, from an average value of their resistances, whether a target MR height is attained or not, and also it is possible to estimate, from the resistance value distribution of the TMR read head elements on the bar member, a distribution and a deviation of MR height adjusted amounts of these TMR read head elements.

In case that resistance change ratios dMRR (%) after lapping are equal to or more than -0.8%, lapping conditions may be modified. It is possible to control time duration and condition of the etching or milling process for recovering from short-circuit by monitoring whether the resistance change ratio dMRR (%) becomes less than -0.8% or not.

Then, a protection film is formed on the lapped surface of the bar member (Step S9).

Thereafter, a resistance of each TMR read head element is measured and also a ratio of change in resistance dMRR (%) of each TMR read head element is obtained (Step S10). The resistance and the ratio of change in resistance dMRR (%) are obtained in the similar manner as done at Step S4. At Step S10, by comparing the first resistance R.sub.1 obtained at this Step S10 and the machining and assembling process initial resistance R.sub.0' obtained at Step S8 with each other, if there is a difference in resistance, it is considered that the resistance of the tunnel barrier layer 53 has changed by damage due to ion milling or oxidization after the lapping process. In such case, a degree of metallic conduction in the barrier layer is evaluated from the resistance change ratio dMRR (%). This evaluation is performed in this embodiment by judging whether the calculated resistance change ratio dMRR (%) is less than a predetermined threshold of -0.8% or not, namely whether the ratio dMRR (%) is negative and its absolute value is more than 0.8% or not. If the ratio dMRR (%) is less than the threshold of -0.8%, a degree of metallic conduction in the barrier layer is low and thus it is evaluated that this TMR read head element is non-defective product with a high element breakdown voltage. Whereas, if the ratio dMRR (%) is equal to or more than the threshold of -0.8%, the ion milling or oxidization may inflict damage to the TMR read head element to provide a high metallic conduction in the barrier layer due to occurrence of pinholes, and thus it is evaluated that this TMR read head element is defective product with a low element breakdown voltage.

Then, on the surface of the ABS side of the bar member, rails are formed by ion milling or else (Step S11).

Thereafter, a resistance of each TMR read head element is measured and also a ratio of change in resistance dMRR (%) of each TMR read head element is obtained (Step S12). The resistance and the ratio of change in resistance dMRR (%) are obtained in the similar manner as done at Step S4. At Step S12, by comparing the first resistance R.sub.1 obtained at this Step S12 and the machining and assembling process initial resistance R.sub.0' obtained at Step S8 with each other, if there is a difference in resistance, it is considered that the resistance of the tunnel barrier layer 53 has changed by damage due to ion milling at the rail forming process. In such case, a degree of metallic conduction in the barrier layer is evaluated from the resistance change ratio dMRR (%). This evaluation is performed in this embodiment by judging whether the calculated resistance change ratio dMRR (%) is less than a predetermined threshold of -0.8% or not, namely whether the ratio dMRR (%) is negative and its absolute value is more than 0.8% or not. If the ratio dMRR (%) is less than the threshold of -0.8%, a degree of metallic conduction in the barrier layer is low and thus it is evaluated that this TMR read head element is non-defective product with a high element breakdown voltage. Whereas, if the ratio dMRR (%) is equal to or more than the threshold of -0.8%, the ion milling may inflict damage to the TMR read head element to provide a high metallic conduction in the barrier layer due to occurrence of pinholes, and thus it is evaluated that this TMR read head element is defective product with a low element breakdown voltage.

Then, the bar member 43 is cut and separated into a plurality of individual magnetic head sliders 44 (Step S13). FIG. 4c illustrates each separated magnetic head slider 44.

The process of the above-mentioned Steps S5-S13 is the machining process.

Thereafter, the magnetic head slider 44 is adhered to a suspension 45 to form an HGA 46 (Step S14), and then terminal pads 44a of the magnetic head slider 44 are bonded to connection pads of a wiring member formed or attached on the suspension 45 (Step S15).

Then, a resistance of the TMR read head element is measured and also a ratio of change in resistance dMRR (%) of the TMR read head element is obtained (Step S16). The resistance is measured, as illustrated in FIG. 4d, by bringing a pair of probes 47 into electrical contact with external connection pads 46a electrically connected to the connection pads of the HGA in the similar manner as done at Step S4, and also the ratio of change in resistance dMRR (%) is obtained. At Step S16, by comparing the first resistance R.sub.1 obtained at this Step S16





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